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Silicon Tetrafluoride

SiF4

DESCRIPTION: Silicon Tetrafluoride (SiF4) is a colorless, toxic, nonflammable gas with a suffocating odor. Silicon Tetrafluoride is shipped as a nonliquefied gas.

APPLICATION: Silicon Tetrafluoride is used to etch metal silicides, silicon and polysilicon films. It disassociates in the presence of an RF field to produce reactive fluoride ions that react with and etch silicon films. Silicon Tetrafluoride demonstrates isotropic etching with good selectivity over silicon dioxide and silicon nitride. Silicon Tetrafluoride is used for these applications in the pure state and also in oxygen mixtures as a precursor in the deposition of silicon nitride films.

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SILICON TETRAFLUORIDE
GRADE ELECTRONIC VLSI
Critical Assay 99.99% 99.998%
Nitrogen < 50 ppm < 3 ppm
Argon + Oxygen < 20 ppm < 1 ppm
Carbon Dioxide < 10 ppm < 1 ppm
Total Hydrocarbons (as CH4) < 10 ppm < 10 ppm
Carbon Monoxide < 10 ppm < 0.5 ppm
Arsenic, Boron, Phosphorous - < 0.5 ppm
Valve Material 316L SS 316L SS
Valve Design Tied Diaphragm Tied Diaphragm
CGA/DISS Connection 330/642 330/642

semi MSDS Silicon Tetrafluoride SiF4.pdf

Molecular Weight:
104.08
Specific Volume:
3.7 cf/lb @ NTP
Boiling Point:
-130.4°F @ 1 atm
CAS No.:
7783-61-1
Hazards:
Inhalation and Skin Contact
Safety Data: LC50: 450 ppm
Physical Properties Data:
  Critical Temperature: 6.5 °F
Critical Pressure: 538.8 psia

 

SILICON TETRAFLUORIDE        
Cylinder Data/Size A B C D LB
Internal Volume (liters): 44 17 7 2.4 0.4
Contents (lbs): 50 18 7.5 2.5 0.4
Pressure @ 70°F (psig): 1,000 1,000 1,000 1,000 1,000
RFO Size (inches): 0.007 0.010 0.014 0.020  
Maximum Flow (scf/h): 15.8 32.2 63.2 129  
Pressure (psia): 1,014.7      
DOT Label: White, Inhalation Hazard; B&W, Corrosive Gas UN Number: UN 1859  
DOT Class: 2.3 Cylinder: Steel alloy  
Recommended OmniGas® Panels: Purgeable panel for toxic gases - Model No. 58PA200SVA
Shelf Life: 1 year

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